S. H. Lee, Y. W. Lee, K. T. Lee, C. Y. Choi, Samsung Electronics co. Ltd, Young-in, South Korea; H. W. Shin, Neosem Inc., Suwon, South Korea; Y. S. Ng, T. Lundquist, DCG Systems, Fremont, CA

Summary: Using the LVP system, signals were probed from transistors operated at ~1.0V. With these signals, we were successful in completing the functional shmoo hole failure analysis. What were critical to the success of this failure analysis were the ability to measure the signals at low operating voltages within a short amount of time, the ability to achieve the spatial resolution required to probe within a 65nm flip-flop and the ability to detect a 400 ps glitch. The LVP technology should continue to provide signal probing solutions as fabrication process technologies continues to shrink to 45 nm and 32 nm where operating voltages are even lower. The high bandwidth performance of the LVP systems provides for analyzing signals like the “glitch”.