The 35th International Symposium for Testing and Failure Analysis (November 15-19, 2009) of ASM
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Wednesday, November 18, 2009 - 8:50 AM

Near-Infrared Microscopy In Semiconductor Failure Analysis Aplications

T. B. Davis, R. R. Reagan, T. Jiang, Y. Sun, Micron Technology, Boise, ID

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Summary: This paper will present a discussion of NIR and laser scanning confocal near-infrared microscopy, sample preparation for NIR microscopy, and will emphasize examples of laser scanning confocal NIR microscopy in the measurement and failure analysis of silicon samples typical to the semiconductor industry.