The 35th International Symposium for Testing and Failure Analysis (November 15-19, 2009) of ASM
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Thursday, November 19, 2009 - 9:40 AM

Ultimate Resolution for Current Localization by Means of Magnetic Techniques

F. Infante, Centre Nationale d'Etudes Spatiales (CNES), Toulouse, France; P. Perdu, CNES-French Space Agency, 31401 Toulouse Cedex 9, France; D. Lewis, IXL laboratory, Talence, France

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Summary: As the new electronics technologies shrink more and more, the need for new defect localization techniques has arisen. The Magnetic Microscopy is a promising technique which has however strong limitations when scanning currents far from the probe. We developed a new methodology, consisting to evaluate the correlation between the measurement and a set of simulations, which increase the technique resolution of a factor comprised between 10 and 20.