W. B. Thompson, J. Notte, L. Scipioni, M. Ananth, L. Stern, D. Ferranti, C. Huynh, S. Sijbrandij, L. Farkas, L. Barriss, C. Sanford, Carl Zeiss SMT, Peabody, MA

Summary: The helium ion microscope presently has 0.3 nm resolution at a 6mm working distance. Secondary electron and backscattered ion mode images are acquired simultaneously. No sample coating is required and dielectrics can be imaged at the highest beam energy and magnification. A Rutherford Backscatter detector provides atomic level film thickness discrimination in small fields of view. A gas injection system with pattern generator gives quality, overspray free, deposition and etch capability.