35th International Symposium for Testing and Failure Analysis (November 15-19, 2009): The Mechanism and Application of Surface Effect On e-Beam Voltage Contrast and Dopant Contrast

The Mechanism and Application of Surface Effect On e-Beam Voltage Contrast and Dopant Contrast

Wednesday, November 18, 2009
Exhibit Hall 3 (San Jose McEnery Convention Center)
Mr. Li-Lung Lai , Semiconductor Manufacturing International Corporation, WuHan, HuBei, China
Ms. Huimin Gao , Semiconductor Manufacturing International Corporation, WuHan, HuBei, China
Dr. Hong Xiao , Hermes Microvision, Inc., San Jose, CA
See more of: Session 7: Posters
See more of: Symposium