35th International Symposium for Testing and Failure Analysis (November 15-19, 2009): A New Failure Analysis Flow of Gate Oxide Integrity Failure in Wafer Fabrication

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A New Failure Analysis Flow of Gate Oxide Integrity Failure in Wafer Fabrication

Wednesday, November 18, 2009
Exhibit Hall 3 (San Jose McEnery Convention Center)
Dr. Chen Changqing , Chartered Semiconductor Mfg Ltd, Singapore, Singapore
Mr. Hua Younan , Chartered Semiconductor Mfg Ltd, Singapore, Singapore
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