35th International Symposium for Testing and Failure Analysis (November 15-19, 2009): Novel Dielectric Etch Chemistry for the Next Generation of Circuit Edit: Delicate to Low-k Dielectrics and Silicon

Novel Dielectric Etch Chemistry for the Next Generation of Circuit Edit: Delicate to Low-k Dielectrics and Silicon

Wednesday, November 18, 2009: 8:50 AM
Meeting Room J1-J2 (San Jose McEnery Convention Center)
Dr. Vladimir V. Makarov , Tiza Lab, LLC, Milpitas, CA
Leo Krasnobayev , Tiza Lab, LLC, Milpitas, CA
See more of: Session 4: Circuit-Edit
See more of: Symposium