35th International Symposium for Testing and Failure Analysis (November 15-19, 2009): Novel Dielectric Etch Chemistry for the Next Generation of Circuit Edit: Delicate to Low-k Dielectrics and Silicon
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Novel Dielectric Etch Chemistry for the Next Generation of Circuit Edit: Delicate to Low-k Dielectrics and Silicon
Wednesday, November 18, 2009: 8:50 AM
Meeting Room J1-J2 (San Jose McEnery Convention Center)
Dr. Vladimir V. Makarov
,
Tiza Lab, LLC, Milpitas, CA
Leo Krasnobayev
,
Tiza Lab, LLC, Milpitas, CA
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Session 4: Circuit-Edit
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