35th International Symposium for Testing and Failure Analysis (November 15-19, 2009): Low Temperature O2 Plasma Process for Scanning Capacitance Sample Preparation

Low Temperature O2 Plasma Process for Scanning Capacitance Sample Preparation

Wednesday, November 18, 2009: 9:40 AM
Meeting Room J3 (San Jose McEnery Convention Center)
Mr. Donald W. Schulte , Hewlett Packard, Corvallis, OR
Terry McMahon , Hewlett Packard, Corvallis, OR
David D. Hall , Hewlett Packard, Corvallis, OR
Mark Johnson , Hewlett Packard, Corvallis, OR
William Stickle , Hewlett Packard, Corvallis, OR
Craig Sanders , Hewlett Packard, Corvallis, OR
Greg Long , Hewlett Packard, Corvallis, OR
See more of: Session 5: Sample Preparation
See more of: Symposium