35th International Symposium for Testing and Failure Analysis (November 15-19, 2009): Session 5: Sample Preparation

Wednesday, November 18, 2009: 8:00 AM-9:40 AM

Meeting Room J3 (San Jose McEnery Convention Center)

Session Chairs:

Ms. Becky Holdford and Robert Champaign

8:00 AM

Localized Epoxy Layer Formation on Surface Defect Using a Micro-brush in a Plucking System
Mr. Kun-Lin Lin, Inotera Memories Inc., Taoyuan, Taiwan; Dr. Jian-shing Luo, Inotera Memories, Inc.; Jeremy D. Russell, Inotera Memories, Inc.

8:25 AM

Deterministic Polishing Applications In Failure Analysis
Mr. Mark E. Kimball, Maxim Integrated Products, Inc.

8:50 AM

Near-Infrared Microscopy In Semiconductor Failure Analysis Aplications
Mr. Thomas B. Davis, Micron Technology; R. R. Reagan, Micron Technology; T. Jiang, Micron Technology; Y. Sun, Micron Technology

9:15 AM

Non-Destructive Failure Analysis in Organic Thin-Film Transistors
Ms. Shih-Ting Liu, Integrated Service Technology Inc.; Tao-Chi Liu, Integrated Service Technology Inc.; Ming-Lun Chang, Integrated Service Technology Inc.; King-Ting Chiang, Integrated Service Technology Inc.; Su-Ping Chiu, Integrated Service Technology Inc.; Jandel Lin, Integrated Service Technology Inc.; Mr. Po-Yuan Lo, Department of Electrical Engineering, National Central University; Pei-Wen Li, Department of Electrical Engineering, National Central University

9:40 AM

Low Temperature O2 Plasma Process for Scanning Capacitance Sample Preparation
Mr. Donald W. Schulte, Hewlett Packard; Terry McMahon, Hewlett Packard; David D. Hall, Hewlett Packard; Mark Johnson, Hewlett Packard; William Stickle, Hewlett Packard; Craig Sanders, Hewlett Packard; Greg Long, Hewlett Packard

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