ISTFA Home   •   Exposition   •   To Register   •   ASM Homepage
Back to "Session 6: Sample Prep for Chip Access and Device Deprocessing" Search
  Back to "Symposium" Search  Back to Main Search

Tuesday, November 16, 2010 - 4:30 PM
6.2

Low Temperature Plasma Decapsulation of Copper-Wire-Bonded and Exposed Copper Metallization Devices

K. D. Staller, Texas Instruments, Tucson, AZ

View in PDF format

Summary: This presentation will cover the comparison of current chemical decapsulation methods to downstream microwave plasma and the effects each method has on maintaining the original state of copper bondwires, copper metal over passivation, and embedded solder joint connections/defects.