39th International Symposium for Testing and Failure Analysis (November 3 – 7, 2013)

November 03 - 07, 2013

Dr. Huimeng Wu

Process Engineer
Carl Zeiss Microscopy, LLC
Ion Beam Application
One Corporation Way
Peabody, MA
USA 01960

Papers:
4.2 Implications of He and Ne Ion Beam Chemistry for Advanced Circuit Editing