FAULT ISOLATION: In-SEM Fault Isolation Using Voltage Contrast, EBIC/EBAC and Resistive Contrast Imaging

Sarnecki, Lori

FAULT ISOLATION: In-SEM Fault Isolation Using Voltage Contrast, EBIC/EBAC and Resistive Contrast Imaging

Tuesday, December 8, 2020: 1:20 PM

Ms. Lori Sarnecki , ON Semiconductor, South Portland, ME, ON Semiconductor, South Portland, ME

Mr. Caleb Daigneault , ON Semiconductor, South Portland, ME

Summary:

This paper offers the combined techniques of optical level fault localization (PEM, LSIM & THS) and in-SEM or E-beam techniques (VC, EBAC, RCI) to successfully perform fault localization.

See more of: Poster Session I
See more of: EDFAS Virtual Workshop