FIB CIRCUIT ANALYSIS AND EDIT: Influence of Dose Delivery of Low-Beam Energy STI Exposure on FinFET Devices

Tuesday, December 8, 2020: 1:50 PM
Mr. Michael Wong , Thermo Fisher Scientific, Fremont, CA
Mr. Oleg Sidorov , Thermo Fisher Scientific, Hillsboro, OR
Mr. Or Haimson , Annapurna Labs Ltd, Amazon, Yokneam, Israel
Mr. Roy Goldman , Annapurna Labs Ltd, Amazon, Yokneam, Israel
Dr. David Donnet , Thermo Fisher Scientific, Eindhoven, Netherlands
Mr. David Tien , Thermo Fisher Scientific, Fremont, CA
Mr. Neel Leslie , Thermo Fisher Scientific, Fremont, CA
Ms. Debbora Ahlgren , Thermo Fisher Scientific, Hillsboro, OR

Summary:

We present a method for using Low Beam Energy Ga+ Focused Ion Beam to exposure Shallow Trench Isolation of active circuitry in 7nm process technology with virtually no impact to the device's functionality.
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