Failure analysis of InGaAs/GaAs nano-ridge lasers by electron beam based nanoprobing
Failure analysis of InGaAs/GaAs nano-ridge lasers by electron beam based nanoprobing
Thursday, October 31, 2024: 9:00 AM
The Pointe (Hilton San Diego Bayfront)
Summary:
FA of emerging devices such as nanoridge lasers is quite challenging. Conventional FA techniques cannot be directly used to localize the defects due to complexity in device architecture. In this paper, we report the systematic FA process to localize the defects in long array of devices using lock-in thermography. Further, we perform cross-section EBIC to identify the local degradation with spatial resolution of few nanometers. Furthermore , deep FA is performed to understand the cause for the failure.
FA of emerging devices such as nanoridge lasers is quite challenging. Conventional FA techniques cannot be directly used to localize the defects due to complexity in device architecture. In this paper, we report the systematic FA process to localize the defects in long array of devices using lock-in thermography. Further, we perform cross-section EBIC to identify the local degradation with spatial resolution of few nanometers. Furthermore , deep FA is performed to understand the cause for the failure.