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| Session 15: Circuit Edit 2 | ||||
| Location: Meeting Room J1-J2 (San Jose McEnery Convention Center) | ||||
| (Please check final room assignments on-site). | ||||
| Session Description: | ||||
| Session Chairs: | Mr. Michael W. Phaneuf Fibics Incorporated, Ottawa, ON, Canada Marsha Abramo Independent Consultant, New York | |||
| 2:00 PM | Low KeV Applications for FIB Circuit Edit | |||
| 2:25 PM | Quantifying the Benefit of Ion Beam Defocus for Circuit Edit Applications | |||
| 2:50 PM | Couple Circuit Edit Skill with OBIRCH Technology to Locate Unrecognizable RF and Mixed-mode Failure | |||