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| Session 18: Metrology | ||||
| Location: Meeting Room E145 (Oregon Convention Center ) | ||||
| (Please check final room assignments on-site). | ||||
| Session Description: | ||||
| Session Chairs: | Ms. Janet Teshima FEI Company, Hillsboro, OR Jeremy Russell Inotera, Taoyuan, Taiwan | |||
| 12:45 PM | 3D STEM tomography based failure analysis of 45 nm CMOS devices | |||
| 1:10 PM | Dopant Analysis on advanced CMOS technologies | |||
| 1:35 PM | SEM Si Doping Contrast Enhancement Using Sample Charging | |||
| 2:00 PM | 3-D image reconstruction in the scanning electron microscope | |||