A Proof for Possibility of Ce-Oxide From CMP Residuals In Si-Wafer by Analytical TEM

Wednesday, November 14, 2012: 10:45 AM

101AB (Phoenix Convention Center)

Dr. Wayne Zhao , GLOBALFOUNDRIES, Hopewell Junction, NY

Dr. Michael Gribelyuk , IBM, Hopewell Junction, NY

Dr. Liem Do Thanh , GLOBALFOUNDRIES, Hopewell Junction, NY

Mary-Ann zaits , IBM, Hopewell Junction, NY

Wing L. Lai , IBM, Hopewell Junction, NY

15.2 A Proof for Possibility of Ce-Oxide From CMP Residuals In Si-Wafer by Analytical TEM