10.7
Study of Static Noise Margin and Circuit Analysis On Advanced Technology Node SRAM Devices By Nanoprobing

Monday, November 4, 2013
The Tech Museum
Dr. Tsu Hau Ng , Globalfoundries Singapore Pte. Ltd., Singapore, Singapore
Dr. M.K. Dawood , Globalfoundries Singapore Pte. Ltd., Singapore, Singapore
Mr. P.K. Tan , Globalfoundries Singapore Pte. Ltd., Singapore, Singapore
H. Tan , Globalfoundries Singapore Pte. Ltd., Singapore, Singapore
Ms. Sabitha James , Globalfoundries Singapore Pte. Ltd., Singapore, Singapore
Mr. Pariyarathu Salimon Limin , Globalfoundries Singapore Pte. Ltd., Singapore, Singapore
Dr. Yamin Huang , Globalfoundries Singapore Pte. Ltd., Singapore, Singapore
Jeffrey Lam , Globalfoundries Singapore Pte. Ltd., Singapore, Singapore
Dr. Z.H. Mai , Globalfoundries Singapore Pte. Ltd., Singapore, Singapore

Summary:

With further technology scaling, it becomes increasingly challenging for conventional methods of failure analysis (FA) to identify the cause of a failure. In this work, we present three case studies on the utilization of advanced nanoprobing for SRAM circuit analysis and fault identification on 20 nm technology node SRAM single bit devices. In the first 2 case studies, conventional failure analysis by passive voltage contrast (PVC) failed to identify any abnormality in the known failed bit. In the third case study, an abnormally bright PVC was observed by PVC inspection. In all three case studies, static noise margin of the SRAM bits during hold and read operations were performed to understand the circuit behavior of the failed bit cell. Next, nanoprobing on the individual transistors were performed to determine the failing transistor within the bit and the possible cause of the failure. TEM analysis was performed to identify and verify the failing mechanism.
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