11.7
In-Situ Characterization of Switching Mechanism in Phase Change Random Access Memory (PRAM) Using Transmission Electron Microscopy (TEM)

Thursday, November 7, 2013: 1:05 PM
Meeting Room 230A (San Jose McEnery Convention Center)
Dr. Seungjoon Jeon , SK Hynix Semiconductor Inc, Ichon-si, South Korea
Sungkyu Son , SK Hynix Semiconductor Inc, Ichon-si, South Korea
Jangwon Oh , SK Hynix Semiconductor Inc, Ichon-si, South Korea
Won Kim , SK Hynix Semiconductor Inc, Ichon-si, South Korea
Hojoung Kim , SK Hynix Semiconductor Inc, Ichon-si, South Korea
Jong Hak Lee , SK Hynix Semiconductor Inc, Ichon-si, South Korea
Seungho Woo , SK Hynix Semiconductor Inc, Ichon-si, South Korea
Gapsok Do , SK Hynix Semiconductor Inc, Ichon-si, South Korea
Seungyun Lee , SK Hynix Semiconductor Inc, Ichon-si, South Korea
Kyungjoon Baek , POSTECH, Pohang, South Korea
Sangho Oh , POSTECH, Pohang, South Korea

Summary:

In this paper, we report an analytical technique to observe continuous phase transition and void formation process of single confined GST cell by multi-pulse AC biasing test of the thin foil specimen using in-situ TEM.