3.3
Improving Failure Analysis for Cell-Internal Defects through Cell Aware Technology

Monday, November 4, 2013: 1:55 PM
Meeting Room 230B (San Jose McEnery Convention Center)
F. Hapke , Mentor Graphics, Hamburg, Germany
Dr. Martin Keim , Mentor Graphics, Wilsonville, OR
T. Herrmann , GLOBALFOUNDRIES, Dresden, Germany
T. Heidel , GLOBALFOUNDRIES, Dresden, Germany
M. Reese , AMD, Inc., Austin, TX
J. Schloeffel , Mentor Graphics, Hamburg, Germany
J. Rivers , AMD, Inc., Austin, TX
W. Redemund , Mentor Graphics, Wilsonville, OR
A. Over , AMD, Inc., Austin, TX
A. Glowatz , Mentor Graphics, Hamburg, Germany
A. Fast , Mentor Graphics, Hamburg, Germany
Brady Benware , Mentor Graphics, Wilsonville, OR
J. Rajski , Mentor Graphics, Wilsonville, OR

Summary:

We introduce a cell-internal test methodology and its application. We will focus on the failure analysis results we obtained using this methodology on a 28nm design. We will discuss the advantages and limitations of the new cell-internal diagnosis helping the failure analysis tasks to quickly and accurately identify cell-internal defects.
See more of: Session 3: Test and Diagnostics
See more of: Symposium