Electro-Optical Frequency Mapping Phase Image Simulation Technique for Fault Isolation

Thursday, November 9, 2017: 8:50 AM
Ballroom A (Pasadena Convention Center)
Mr. Junpei Nonaka , Renesas Semiconductor Manufacturing, hitachinaka-shi, ibaraki-ken, Japan
Mr. Nakaba Matsui , Renesas Engineering Service, Kodaira-shi, Japan
Mr. Seiichi Honbu , Renesas Engineering Service, Kodaira-shi, Japan
Dr. Kazuki Shigeta , Renesas Electronics, Kodaira-shi, Japan
Mr. Yukihisa Funatsu , Renesas Electronics, Kodaira-shi, Japan


A EOFM phase image simulation method is proposed to collage measurement results with circuit layout. Short cycle test pattern generation method is also described for applying enable EOFM to combinational logic.
See more of: Fault Isolation II
See more of: Technical Program