Against Ion Beam Impact by Applying the Significant Protection Layer on Double Ex situ Lift-out TEM specimen

Tuesday, November 12, 2019: 1:00 PM
F 150/151 (Oregon Convention Center)
Dr. Chun-Hung Lin , Macronix International Co., Ltd., Hsin-chu, Taiwan
Dr. Hsin-Cheng Hsu , Macronix International Co., Ltd., Hsin-chu, Taiwan
Mr. Tsung-Yi Lin , Macronix International Co., Ltd., Hsin-chu, Taiwan
Mrs. Ru-Hui Lin , Macronix International Co., Ltd., Hsin-chu, Taiwan
Mr. I-An Chen , Macronix International Co., Ltd., Hsin-chu, Taiwan
Mrs. Pei-Lin Hsu , Macronix International Co., Ltd., Hsin-chu, Taiwan
Mr. Chao-Kun Chen , Macronix International Co., Ltd., Hsin-Chu, Taiwan
Ms. Iris Hsieh , Macronix International Co., Ltd., Hsin-Chu, Taiwan
Mr. Chin-Chih Yeh , Macronix International Co., Ltd., Hsin-chu, Taiwan
Mr. Nan-Tzu Lian , Macronix International Co., Ltd., Hsin-chu, Taiwan
Mr. Ta-Hone Yang , Macronix International Co., Ltd., Hsin-chu, Taiwan
Mr. Kuang-Chao Chen , Macronix International Co., Ltd., Hsin-chu, Taiwan

Summary:

We have introduced three approaches to have protecting layer during performing either double INLO or double EXLO process. According to the property of sample and its preliminary treatment in FIB, the satisfactory approach can be applied. By applying the method, we demonstrated the detail in TEM lamella can be obtained without ion impact during the sample fabrication.
See more of: FIB Sample Preparation
See more of: Technical Program