Transistor Level Reliability Assessment of Gate Oxide Defects by BTI Stress Nanoprobing

Tuesday, November 12, 2019: 1:00 PM
D 137/138 (Oregon Convention Center)
Mr. David Albert , IBM, Hopewell Junction, NY
Mr. Michael Tenney , IBM, Hopewell Junction, NY
Zhigang Song , IBM, Hopewell Junction, NY
Mr. Patrick McGinnis , IBM, Hopewell Junction, NY
Mr. Johns Oarethu , IBM, Hopewell Junction, NY

See more of: Nanoprobing and Electrical Characterization II
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