Residual EG Oxide in FinFET Analyses and Its Impact to Yield, Product Performance, and Transistor Reliability

Thursday, November 14, 2019: 3:20 PM

D 137/138 (Oregon Convention Center)

Mr. Patrick McGinnis , IBM, Hopewell Junction, NY

Mr. David Albert , IBM, Hopewell Junction, NY

Dr. Zhigang Song , IBM, Hopewell Junction, NY

Mr. John Sylvestri , IBM, Hopewell Junction, NY

Mr. Phong Tran , IBM, Hopewell Junction, NY

Mr. Johns Oarethu , IBM, Hopewell Junction, NY

Mr. Michael Tenney , IBM, Hopewell Junction, NY

Mr. Greg Hornicek , IBM, Hopewell Junction, NY