AFM in SEM for device characterization and defect localization

Thursday, November 3, 2022: 1:40 PM
Ballroom A (Pasadena Convention Center)
Mr. Gregory Johnson , ZEISS Microscopy, Poughkeepsie, NY
Dr. Frank Hitzel , DoubleFox GmbH, Braunschweig, NY, Germany

Summary:

A unique method for semiconductor characterization involving AFM in SEM system is described. Results are shown demonstrating the ability of SEM exposure combined with use of appropriate AFM tips to prepare a clean surface for SRAM characterization. A second example is described showing well EBAC.
See more of: Scanning Probe Analysis II
See more of: Technical Program