Utilizing PFIB for preparing TEM lamellae tailored to high aspect ratio 3D NAND structures
Utilizing PFIB for preparing TEM lamellae tailored to high aspect ratio 3D NAND structures
Wednesday, October 30, 2024: 10:40 AM
204 (Hilton San Diego Bayfront)
Summary:
We have introduced a practical method for preparing TEM lamellae of high aspect ratio samples using PFIB systems. Considering the curtaining effect and the lower efficiency of TEM sample preparation as using the general FIB milling method, the PFIB window delayering method emerges as a suitable alternative approach. The results demonstrate that the HAR sample prepared by PFIB delayering method processed good uniformity and minimal curtaining effects. Furthermore, the PFIB window delayering method can avoid the sample bending issue by making the ROI surrounded with thick regions during the TEM lamella preparation. This method has the potential to be applied in many cases, such as ultra-high aspect ratio samples and samples with specific defect sites.
We have introduced a practical method for preparing TEM lamellae of high aspect ratio samples using PFIB systems. Considering the curtaining effect and the lower efficiency of TEM sample preparation as using the general FIB milling method, the PFIB window delayering method emerges as a suitable alternative approach. The results demonstrate that the HAR sample prepared by PFIB delayering method processed good uniformity and minimal curtaining effects. Furthermore, the PFIB window delayering method can avoid the sample bending issue by making the ROI surrounded with thick regions during the TEM lamella preparation. This method has the potential to be applied in many cases, such as ultra-high aspect ratio samples and samples with specific defect sites.