The Impact of TEM Analysis Temperature and Deposition Layer Quality on Photoresist Profiles using Cryo-FIB and Cryo-TEM
The Impact of TEM Analysis Temperature and Deposition Layer Quality on Photoresist Profiles using Cryo-FIB and Cryo-TEM
Thursday, October 31, 2024
Indigo Ballroom (Hilton San Diego Bayfront)
Summary:
This paper presents the characteristic of the cryo-workflow on PR profiles using cryo-FIB and cryo-TEM.
This paper presents the characteristic of the cryo-workflow on PR profiles using cryo-FIB and cryo-TEM.