A Quantitative and Automated Quality Metric for Delayering Integrated Circuits

Thursday, October 31, 2024
Indigo Ballroom (Hilton San Diego Bayfront)
Mr. Noah Padro , Battelle Memorial Institute, Columbus, OH
Dr. Timothy Balint , Battelle Memorial Institute, Columbus, OH
Mr. Nick Harner , Battelle Memorial Institute, Columbus, OH
Mr. Jon Scholl , Battelle Memorial Institute, Columbus, OH
Mr. Yash Patel , Battelle Memorial Institute, Columbus, OH
Dr. Adam Kimura , Battelle Memorial Institute, Columbus, OH
Mr. Matt Sale , Air Force Research Lab, Dayton, OH

Summary:

Here we present a method for quantifying the quality of sample preparation using optical images. This is done by automatically establishing zones of relatively consistently dense circuitry and analyzing the color differences among these zones during delayering workflows.
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