Microscopy Analysis and Material Characterization - High-Resolution Ion Microscopy and SIMS Nanoanalytics for Microelectronics Applications
Microscopy Analysis and Material Characterization - High-Resolution Ion Microscopy and SIMS Nanoanalytics for Microelectronics Applications
Wednesday, November 19, 2025
Summary:
The ability to analyze and characterize nanoscale materials with high precision is crucial in semiconductor technology and failure analysis. This study presents a novel high-resolution ion microscopy system that integrates a Liquid Metal Alloy Ion Source (LMAIS), secondary ion mass spectrometry (SIMS), and a high-precision laser interferometer-controlled stage with CAD-based navigation. This combination enables high-resolution correlative 2D/3D imaging, precise elemental analysis, and automated sample navigation using GDSII and KLARF files, providing critical insights for microelectronics manufacturing, process monitoring, and failure analysis.
The ability to analyze and characterize nanoscale materials with high precision is crucial in semiconductor technology and failure analysis. This study presents a novel high-resolution ion microscopy system that integrates a Liquid Metal Alloy Ion Source (LMAIS), secondary ion mass spectrometry (SIMS), and a high-precision laser interferometer-controlled stage with CAD-based navigation. This combination enables high-resolution correlative 2D/3D imaging, precise elemental analysis, and automated sample navigation using GDSII and KLARF files, providing critical insights for microelectronics manufacturing, process monitoring, and failure analysis.