Emerging Technologies II

Thursday, May 4, 2017: 11:00 AM-12:40 PM
Ballroom DE (Rhode Island Convention Center)
Chris Stoessel, Eastman Chemical Company and Manuela Junghaehnel, Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP
11:40 AM
Circular HV Magnetron Sputtering Source for in-situ RE doping of ECR-PECVD Si-based thin films
Jeremy W. Miller, McMaster University; Jacek Wojcik, McMaster University; Jonathan Bradley, McMaster University; Peter Mascher, McMaster University
12:00 PM
Linearized Hollow Cathode Plasma for PECVD
John R. Chambers, AGC/Interpane
12:20 PM
Hydrogen storage performance of a nanoporous activated carbon cloth-like material doped by palladium
Nikolaos Kostoglou, University of Leoben; Biljana Babic, Vinca Institute of Nuclear Sciences; Branko Matovic, Vinca Institute of Nuclear Sciences; Christos Tampaxis, Demokritos National Center for Scientific Research; Georgia Charalambopoulou, Demokritos National Center for Scientific Research; Theodore Steriotis, Demokritos National Center for Scientific Research; Georgios Constantinides, Cyprus University of Technology; Kyriaki Polychronopoulou, Khalifa University of Science, Technology and Research; Charalambos Doumanidis, Khalifa University of Science, Technology and Research; Mark Baker, University of Surrey; Etienne Bousser, The University of Manchester; Allan Matthews, The University of Manchester; Velislava Terziyska, University of Leoben; Christian Mitterer, University of Leoben; Claus Rebholz, University of Cyprus