The 35th International Symposium for Testing and Failure Analysis (November 15-19, 2009) of ASM

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Microscopy
Location: Meeting Room J3 (San Jose McEnery Convention Center)
(Please check final room assignments on-site).
Session Description: A picture of the defect remains the goal for most failure analysis. A successful analyst knows how to make the right picture, and how to interpret the picture. In the Microscopy Track, we will discuss the theory and applications of optical, atomic and electron microscopy.

Session Chair:Ms. Susan Li Spansion Inc, Sunnyvale, CA
8:15 AMX-Ray & SAM Challenges for IC Package Inspection
9:00 AMTEM Techniques for FA
10:30 AMBreak
11:00 AMThe Role of the AFM in Yield and FA
12:00 PMLunch
1:00 PMScanning Electron Microscopy
2:15 PMUltra-High Resolution Scanning Electron Microscopy
3:15 PMBreak
3:30 PMOptical and Infrared FA Microscopy