Development of Productive Polishing TEM Sample Preparation Methodology

Thursday, November 13, 2014: 8:25 AM
310 A (George R. Brown Convention Center )
Dr. Huisheng Yu , Semiconductor Manufacturing International (Shanghai) Corp., Shanghai, China
Mrs. Shuqing Duan , Semiconductor Manufacturing International (Shanghai) Corp., Shanghai, China
Ming Li , Semiconductor Manufacturing International (Shanghai) Corp., Shanghai, China
Qihua Zhang , Semiconductor Manufacturing International (Shanghai) Corp., Shanghai, China
Wei-Ting Kary Chien , Semiconductor Manufacturing International (Shanghai) Corp., Shanghai, China

See more of: Sample Preparation and Device Deprocessing II
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