Sample Preparation and Device Deprocessing II
Thursday, November 13, 2014: 8:00 AM-9:40 AM
310 A (George R. Brown Convention Center )
Session Chairs:
Mr. Roger Alvis
and
Mr. Bryan Tracy
8:25 AM
Development of Productive Polishing TEM Sample Preparation Methodology
Dr. Huisheng Yu, Semiconductor Manufacturing International (Shanghai) Corp.;
Mrs. Shuqing Duan, Semiconductor Manufacturing International (Shanghai) Corp.;
Ming Li, Semiconductor Manufacturing International (Shanghai) Corp.;
Qihua Zhang, Semiconductor Manufacturing International (Shanghai) Corp.;
Wei-Ting Kary Chien, Semiconductor Manufacturing International (Shanghai) Corp.
8:50 AM
Optimization of TEM Sample Preparation to Reduce the Overlapping of TEM Images
Mrs. Shuqing Duan, Semiconductor Manufacturing International (Shanghai) Corp.;
Liu Chen, Semiconductor Manufacturing International (Shanghai) Corp.;
Dr. Huisheng Yu, Semiconductor Manufacturing International (Shanghai) Corp.;
Ming Li, Semiconductor Manufacturing International (Shanghai) Corp.;
Qihua Zhang, Semiconductor Manufacturing International (Shanghai) Corp.;
Wei-Ting Kary Chien, Semiconductor Manufacturing International (Shanghai) Corp.