30.1
A Study of How Different FIB Beam Current Intensities Locate Possible Defects
A Study of How Different FIB Beam Current Intensities Locate Possible Defects
Wednesday, November 4, 2015
Exhibit Hall D (Oregon Convention Center )
Summary:
Voltage Contrast (VC) is a useful technique and used widely in failure analysis of Integrated Circuit (IC). This paper will demonstrate different FIB current intensities in a specific case and by means of the technique of VC locates possible defect locations quickly. With the help of Conductive-Atomic Force Microscope (C-AFM), we can get an electrical verification at the same time. We discuss the relationship of VC and C-AFM what the root cause of this case is in the end.
Voltage Contrast (VC) is a useful technique and used widely in failure analysis of Integrated Circuit (IC). This paper will demonstrate different FIB current intensities in a specific case and by means of the technique of VC locates possible defect locations quickly. With the help of Conductive-Atomic Force Microscope (C-AFM), we can get an electrical verification at the same time. We discuss the relationship of VC and C-AFM what the root cause of this case is in the end.