Plasma FIB DualBeam™ Delayering for Atomic Force nanoProbing™ of 14 nm FinFET Devices in an SRAM Array

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Plasma FIB DualBeam™ Delayering for Atomic Force nanoProbing™ of 14 nm FinFET Devices in an SRAM Array

Thursday, November 5, 2015: 8:25 AM

Meeting Room D139 & 140 (Oregon Convention Center )

Mr. Roger Alvis , FEI Company, Hillsboro, OR

Mr. Trevan Landin , FEI Company, Hillsboro, OR

Dr. Chad Rue , FEI Company, Hillsboro, OR

Mr. Andy Erickson , Multiprobe, Santa Barbara, CA

Mr. Sean Zumwalt , Multiprobe, Santa Barbara, CA

Mr. Sinjin Dixon-Warren , Chipworks, Ottawa, ON, Canada

Wan-Yi Liu , Materials Analysis Technology Inc., Hsinchu, Taiwan

Shih-Hsin Chang , Materials Analysis Technology Inc., Hsinchu, Taiwan

Te-Fu Chang , Materials Analysis Technology Inc., Hsinchu, Taiwan

Mr. Chia-Hsiang Yen , Materials Analysis Technology Inc., Hsinchu, Taiwan

Pau-Sheng Kuo , Materials Analysis Technology Inc., Hsinchu, Taiwan

Dr. C H Chu , Materials Analysis Technology Inc., Hsinchu, Taiwan