Enhanced Localization of Non Linear Defects in Sub 14nm BEOL Structures

Monday, November 7, 2016: 12:35 PM
113 (Fort Worth Convention Center)
Mr. Terence Kane , IBM, Hopewell Junction, NY
Mr. Michael Tenney , IBM, Hopewell Junction, NY

Summary:

The paper introduces a new, novel technique of localization at level non linear defects in sub 14nm structures not possible with legacy FIB voltage contrast, SEM voltage contrast or EBAC methods
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