Electron Beam Induced Resistance CHange (EBIRCH) for Device Characterization and Defect Localization

Monday, November 7, 2016: 2:25 PM
110AB (Fort Worth Convention Center)
Mr. Gregory M. Johnson , GLOBALFOUNDRIES, Hopewell Junction, NY
Mr. Christopher D'Aleo , GLOBALFOUNDRIES, Hopewell Junction, NY
Dr. Ziyan Xu , GLOBALFOUNDRIES, Hopewell Junction, NY
Mr. Harvey E. Berman , GLOBALFOUNDRIES, Hopewell Junction, NY
Dr. Yi Feng , GLOBALFOUNDRIES, Hopewell Junction, NY
Dr. Un-Oh Known , GLOBALFOUNDRIES, Hopewell Junction, NY
Mr. Brian Yates , GLOBALFOUNDRIES, Hopewell Junction, NY
Mr. Scott Darling , GLOBALFOUNDRIES, Hopewell Junction, NY
Dr. Yunyu Wang , GLOBALFOUNDRIES, Hopewell Junction, NY
Dr. Markus Kagerer , DCG Systems, Inc., Fremont, CA
Mr. R. H. Newton , DCG Systems, Inc., Fremont, CA

See more of: Nanoprobing and Electrical Characterization II
See more of: Technical Program