EDS Mapping of Thin Surface Films – Evaluating the Practical Limits of Low kV Imaging and Microanalysis with Low Energy M Lines, Silicon Drift Detectors and High Transmission SiN Windows by Plasma Removal of Carbon and Oxygen
EDS Mapping of Thin Surface Films – Evaluating the Practical Limits of Low kV Imaging and Microanalysis with Low Energy M Lines, Silicon Drift Detectors and High Transmission SiN Windows by Plasma Removal of Carbon and Oxygen
Wednesday, November 9, 2016: 5:35 PM
110AB (Fort Worth Convention Center)
Summary:
This work will explore the detection of low and ultra-low x-ray energy lines, including InM, AlL and SiL, using materials science applications where these detection improvements allow never before achieved performance in spectral analysis, surface sensitive analysis and low kV mapping.
This work will explore the detection of low and ultra-low x-ray energy lines, including InM, AlL and SiL, using materials science applications where these detection improvements allow never before achieved performance in spectral analysis, surface sensitive analysis and low kV mapping.