Microscopy

Wednesday, November 9, 2016: 3:30 PM-6:00 PM
110AB (Fort Worth Convention Center)
Chairs:  Mr. Ted Kolasa, Electrical Engineering, Orbital ATK, Chandler, AZ
Co-chairs:  Dr. Yu Zhu, IBM TJ Watson Research Center, Yorktown Heights, NY
3:30 PM
Automated 3D EDS for Spatially Resolved Elemental Characterization of Semiconductors
Mr. Kevin McIlwrath, JEOL USA, Inc
3:55 PM
Investigation of Phase Change Memory Confined Cell Endurance Using Transmission Electron Microscopy (TEM)
Dr. Yu Zhu, IBM TJ Watson Research Center
4:20 PM
Failure Analysis Work Flow for Dislocation Identification and Characterization by Electron Channeling Contrast Imaging using SEM and FIB
Dr. Yongkai Zhou, Carl Zeiss Microscopy GmbH; Dr. Luyang Han, Carl Zeiss Microscopy GmbH; Ingo Schulmeyer, Carl Zeiss Microscopy
4:45 PM
Elemental Characterisation of sub 20nm structures in devices using low energy SEM-EDS
Dr. James T. Sagar, Oxford Instruments Nanoanalysis; Dr. Connor McCarthy, Oxford Instruments Nanoscience; Dr. Simon R. Burgess, Oxford Instruments Nanoanalysis; Mr. Xiaobing Li, Oxford Instruments Nanoanalysis
5:10 PM
Innovative Non-destructive Compositional Mapping of Trace (Sub-PPM) Elements and Contaminants at Microns-Scale
Dr. Wenbing Yun, PhD, Sigray, Inc.; Mr. SH Lau, Sigray, Inc.
5:35 PM
EDS Mapping of Thin Surface Films – Evaluating the Practical Limits of Low kV Imaging and Microanalysis with Low Energy M Lines, Silicon Drift Detectors and High Transmission SiN Windows by Plasma Removal of Carbon and Oxygen
Dr. Bryan Tracy, PhD, EAG Laboratories; Ms. Tara Nylese, Evans Analytical Group; Mr. Vincent Carlino, ibss Group, Inc.
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