Device Dielectric Quality analysis and Fault Isolation at the contact level by scanning Microwave Impedance Microscopy

Thursday, November 10, 2016: 12:55 PM
108 (Fort Worth Convention Center)
Dr. Wei-Shan Hu , TSMC (Taiwan Semiconductor Manufacturing Company, Ltd.), Hsinchu, Taiwan
Mr. Oskar Amster , PrimeNano, Inc., Palo Alto, CA

See more of: Scanning Probe Analysis II
See more of: Technical Program