Patterning in an Imperfect World: Limitations of Focused Ion Beams and their Effects on Advanced Applications at the 14 nm Process Node

Tuesday, November 8, 2016: 3:45 PM
108 (Fort Worth Convention Center)
Mr. Christopher M. Scheffler , Intel Corporation, Santa Clara, CA
Mr. Richard H. Livengood , Intel Corporation, Santa Clara, CA
Mr. Michael W. Phaneuf , Fibics Incorporated, Ottawa, ON, Canada
Dr. Ken Lagarec , Fibics Incorporated, Ottawa, ON, Canada
Dr. Haripriya E. Prakasam , Intel Corporation, Santa Clara, CA

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