FIB Circuit Analysis and Edit

Tuesday, November 8, 2016: 2:55 PM-5:00 PM

108 (Fort Worth Convention Center)

Chairs: Mr. Richard Livengood, Intel Corporation, Santa Clara, CA

Co-chairs: Mr. Jason M. Benz, BS/MS Microelectronic Eng & Materials Science, IBM Microelectronics, Essex Jct,, VT

2:55 PM

3:45 PM

Patterning in an Imperfect World: Limitations of Focused Ion Beams and their Effects on Advanced Applications at the 14 nm Process Node
Mr. Christopher M. Scheffler, Intel Corporation; Mr. Richard H. Livengood, Intel Corporation; Mr. Michael W. Phaneuf, Fibics Incorporated; Dr. Ken Lagarec, Fibics Incorporated; Dr. Haripriya E. Prakasam, Intel Corporation

4:10 PM

Measuring the Performance Effects of Diffusion Exposure by FIB
Dr. Michael DiBattista, Qualcomm, Inc.; Mr. R.K. Jain, Advanced Circuit Engineers

4:35 PM

See more of: Technical Program