Microscopy I

Wednesday, November 8, 2017: 8:00 AM-9:40 AM
Ballroom C (Pasadena Convention Center)
Dr. Tom Schamp, Hitachi High Technologies, America and Dr. Yu Zhu, IBM TJ Watson Research Center
8:00 AM
Transmission Electron Microscopy Nano Beam Diffraction Sensitivity Study in Focused Ion Beam Prepared Semiconductor Test Structures
Dr. James J. Demarest, IBM
8:25 AM
EBIC and EBAC Analysis of Site Specific STEM Samples
Dr. Tom Schamp, Hitachi High Technologies, America; Mr. Yuya Suzuki, Hitachi High Technologies Coorporation; Mr. Junichi Fuse, Hitachi High Technologies Coorporation; Mr. Katsuji Ito, Hitachi High Technologies Coorporation; Mr. Hiroyuki Tanaka, Hitachi High Technologies Coorporation; Mr. Akira Kageyama, Hitachi High Technologies Coorporation; Mr. Yasuhira Nagakubo, Hitachi High Technologies Coorporation; Mr. Takayuki Mizuno, Hitachi High Technologies Coorporation
8:50 AM
High Throughput Phase Mapping for Metrology Using Low-loss EELS
Dr. Lianfeng Fu, Lam Research Corporation; Dr. Lifan Chen, Western Digital; Dr. Haifeng Wang, PhD, Western Digital Corporation
9:15 AM
STUDENT PAPER: Investigation of switching mechanism in HfO2-based oxide resistive memories by in-situ Transmission Electron Microscopy (TEM) and Electron Energy Loss Spectroscopy (EELS)
Mr. Tristan Dewolf, Univ. Grenoble Alpes; Dr. David Cooper, Univ. Grenoble Alpes; Dr. Adeline Grenier, Univ. Grenoble Alpes; Dr. Helen Grampeix, Univ. Grenoble Alpes; Dr. Christelle Charpin, Univ. Grenoble Alpes; Mr. François Nardelli, Univ. Grenoble Alpes; Mr. Sébasttien Pauliac, Univ. Grenoble Alpes; Mrs. Sophie Bernasconi, Univ. Grenoble Alpes; Dr. Eric Jalaguier, Univ. Grenoble Alpes; Dr. Guillaume Audoit, Univ. Grenoble Alpes; Dr. Sylvie Schamm-Chardon, CEMES
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