Use of analog simulation in failure analysis:Application to Emission microscopy and laser Voltage Probing techniques

Monday, October 29, 2018: 1:50 PM
225AB (Phoenix Convention Center)
Mr. Etienne Auvray , ST Microelectronics,, Grenoble Cedex, France
Mr. Paul Armagnat , ST microelectronics, GRENOBLE, France
Dr. Luc Saury , ST microelectronics, GRENOBLE, France
Dr. Antoine Reverdy , IMS laboratory, University of Bordeaux, Talence, France
Mr. Tommaso Melis , ST microelectronics, GRENOBLE, France

Summary:

The aim of the simulation solution proposed in this paper is to help the failure analyst to interpret emission images on Analog IP by providing an estimation of the emission intensity on a golden ‘virtual’ sample, and potentially on a ‘virtual’ failing sample to be compared with effective photoemission measurement performed on a real tool. In the same way, while performing Laser Voltage Probing investigation, it would be very interesting to get a support of a simulation tool in order to be able to compare the collected waveform with the simulated one.
See more of: Fault Isolation
See more of: Technical Program