Ms. Tanya Schaeffer

GLOBALFOUNDRIES
Malta, NY
USA 12020

Papers:

Identifying the Root Cause of Source-Drain Leakage Caused Soft Fail in Advanced Bulk FinFET Devices
Application of Novel Low Current OBIRCH Amplifier and Nanoprobing to identify subtle Leakages in Advanced Node Technologies
Die-Level Scanning Capacitance Microscopy Fault Isolation on SOI Fin-FET Devices for Advanced Semiconductor Nodes