(V) Plasma FIB Delayering and Nanoprobe EBIRCH for Localizing DRAM Metal Short
(V) Plasma FIB Delayering and Nanoprobe EBIRCH for Localizing DRAM Metal Short
Thursday, November 4, 2021: 3:25 PM
104 ABC (Phoenix Convention Center)
Summary:
This paper demonstrates how to localize metal-to-metal short failures in DRAM, where defects can occur over a large area including the aluminum layer, by using the means of mechanical grinding, plasma FIB delayering, and EBIRCH.
This paper demonstrates how to localize metal-to-metal short failures in DRAM, where defects can occur over a large area including the aluminum layer, by using the means of mechanical grinding, plasma FIB delayering, and EBIRCH.