Resistive Open Defect Isolation in Nano-probing
Resistive Open Defect Isolation in Nano-probing
Thursday, November 4, 2021: 10:15 AM
105 AB (Phoenix Convention Center)
Summary:
In this paper, we present case studies of localizing resistive open defects using various FA techniques, including two-terminal IV, two-terminal EBAC, EBIRCh, Pulsed IV, CV and SCM. The advantage and limitation of each technique will be discussed.
In this paper, we present case studies of localizing resistive open defects using various FA techniques, including two-terminal IV, two-terminal EBAC, EBIRCh, Pulsed IV, CV and SCM. The advantage and limitation of each technique will be discussed.