EBIRCH localization for low-current soft fails

Thursday, November 4, 2021: 11:05 AM
105 AB (Phoenix Convention Center)
Mr. Gregory Johnson , ZEISS Microscopy, Poughkeepsie, NY
Andreas Rummel , Kleindiek Nanotechnik, Reutlingen, Germany

Summary:

SRAM devices intentionally overstressed at successfully higher voltages, then EBIRCH analyzed. This work shows successful EBIRCH localization at only 12 nA of current. Subsequent analyses provide evidence for mechanism of EBIRCH effect.