(V) Selective dry etch removal of Si and SiOxNy for advanced electron beam probing applications

Wednesday, November 3, 2021: 8:25 AM
105 AB (Phoenix Convention Center)
Dr. Mary Edmonds , Intel Corporation, Hillsboro, OR
Thaddeus Cox , Intel Corporation, Hillsboro, OR
John Markulin , Intel Corporation, Hillsboro, OR
Dr. Martin Von Haartman , Intel Corporation, Hillsboro, OR

See more of: Sample Preparation and Device Deprocessing
See more of: Technical Program