Microscopy Analysis and Material Characterization II

Thursday, October 8, 2026: 10:20 AM-11:20 AM
10:20 AM
Multiscale Characterization of Hydrogen Plasma–Induced Defects in Semiconductor Materials
Dr. Ashok Ranjan, Micron Technology; Ms. Ching-Shan Sung, Micron; Ms. Bi Jen Chen, Micron
10:40 AM
Low noise STEBIC on low resistive samples
Dr. René Hammer, point electronic GmbH; Dr. Grigore Moldovan, point electronic GmbH
11:00 AM
Enhanced Passive Voltage Contrast Imaging Using a Compound Lens Enabled by In-Lens Detector Optimization for Advanced Semiconductor Devices
Dr. Noriyuki Inoue, JEOL Ltd.; Mr. Yasuyuki Okano, JEOL Ltd.; Shinobu Uno, JEOL Ltd.; Dr. Shunsuke Asahina, JEOL Ltd.
See more of: Technical Program
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